Title :
Three-dimensional pole edge effect on narrow track film heads
Author :
Kishigami, J. ; Itoh, K. ; Koshimoto, Y.
Author_Institution :
Appl. Electron Lab., NTT, Tokyo, Japan
fDate :
11/1/1988 12:00:00 AM
Abstract :
Heads with 1.5-20-μm track widths have been fabricated using ion-beam etching. Three-dimensional numerical calculations, the micro-Kerr technique, and precise read-write measurements have been carried out to analyze the width dependence of the very narrow tracks at the pole tip. The results show that a 2-μm-track-width head with single-layer film achieves an acceptable level of domain configuration control and can be used to increase recording density
Keywords :
Kerr magneto-optical effect; magnetic heads; magnetic recording; magnetic thin film devices; sputter etching; 1.5 to 20 micron; 3D numerical calculations; 3D pole edge effect; domain configuration control; ion-beam etching; micro-Kerr technique; narrow track film heads; read-write measurements; recording density; single-layer film; track widths; Disk recording; Etching; Frequency response; Magnetic analysis; Magnetic fields; Magnetic films; Magnetic heads; Microcomputers; Numerical analysis; Scanning electron microscopy;
Journal_Title :
Magnetics, IEEE Transactions on
