DocumentCode :
1488334
Title :
Hybrid Silicon Laser Technology: A Thermal Perspective
Author :
Sysak, Matthew N. ; Liang, Di ; Jones, Richard ; Kurczveil, Geza ; Piels, Molly ; Fiorentino, Marco ; Beausoleil, Raymond G. ; Bowers, John E.
Author_Institution :
Photonics Technol. Labs., Intel Corp., Santa Clara, CA, USA
Volume :
17
Issue :
6
fYear :
2011
Firstpage :
1490
Lastpage :
1498
Abstract :
In this paper, the hybrid silicon laser integration platform is analyzed from a thermal perspective. Key laser performance limitations are identified under high temperature and high electrical power operating conditions. Particular attention is paid to the low thermal conductivity buried oxide layer that is utilized for optical confinement. A novel approach is presented and demonstrated to reduce the effect of the buried oxide and its application to a variety of thermally limited hybrid silicon devices is discussed.
Keywords :
integrated optics; quantum well lasers; silicon-on-insulator; thermal conductivity; Si; buried oxide layer; high electrical power operation; high temperature operation; hybrid silicon laser integration; optical confinement; thermal conductivity; thermally limited hybrid silicon devices; Optoelectronic devices; Semiconductor lasers; Silicon on insulator technology; Temperature measurement; Thermal conductivity; Thermal factors; Laser thermal factors; optoelectronic devices; semiconductor lasers; silicon on insulator technology;
fLanguage :
English
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
1077-260X
Type :
jour
DOI :
10.1109/JSTQE.2011.2109940
Filename :
5742675
Link To Document :
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