DocumentCode :
148899
Title :
Fine-pitch solder joining for high density interconnection
Author :
Sueoka, Kazuhisa ; Kohara, S. ; Horibe, A. ; Yamada, Fumihiko ; Mori, Hisamichi ; Orii, Y.
Author_Institution :
IBM Res. - Tokyo, Kawasaki, Japan
fYear :
2014
fDate :
23-25 April 2014
Firstpage :
600
Lastpage :
603
Abstract :
We have studied a thermo-compression bonding method for high density interconnections. Fluxes are commonly used in conventional solder bonding. However, flux applications have several issues such as the void generation in solder and the flux residue remaining between bumps. These could degrade their reliabilities seriously when the bump pitch becomes small since these features do not scale to bump-pitch dimensions. In this paper, we present the experimental results on the investigation of flux-less bonding with a hydrogen radical plasma treatment in fine-pitch bump joining, in order to eliminate these issues. Experimental results of 10 μm-pitch solder bonding showed good metallic continuities at joining interfaces without any organic residues, showing advantages of flux-less bonding on fine-pitch solder bonding.
Keywords :
fine-pitch technology; interconnections; lead bonding; soldering; voids (solid); bump pitch; fine pitch solder joining; flux residue; high density interconnection; hydrogen radical plasma treatment; solder bonding; thermocompression bonding method; void generation; Bonding; Gold; Hydrogen; Nickel; Reliability; Silicon; Substrates; 3D integration; Flux; Hydrogen radical; Solder bonding; Thermal compression bonding;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Packaging (ICEP), 2014 International Conference on
Conference_Location :
Toyama
Print_ISBN :
978-4-904090-10-7
Type :
conf
DOI :
10.1109/ICEP.2014.6826750
Filename :
6826750
Link To Document :
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