DocumentCode :
148903
Title :
Effects of bump height and UBM structure on the reliability performance of 60µm-pitch solder micro bump interconections
Author :
Yu-Wei Huang ; Chau-Jie Zhan ; Lin Yu-Min ; Jing-Ye Juang ; Shin-Yi Huang ; Su-Mei Chen ; Chia-Wen Fan ; Ren-Shin Cheng ; Shu-Han Chao ; Lin, C.K. ; Jie-An Lin ; Chih Chen
Author_Institution :
Electron. & Optoelectron. Res. Labs., Ind. Technol. Res. Inst., Hsinchu, Taiwan
fYear :
2014
fDate :
23-25 April 2014
Firstpage :
612
Lastpage :
617
Abstract :
Recently, three dimensional integration circuits technology has received much attention since the demands of functionality and performance in microelectronic packaging for electronic products are rapidly increasing. For high-performance 3D chip stacking, high density interconnections are required. In the current types of interconnects, solder micro bumps have been widely adopted. For fine pitch solder micro bump joints, selections of bump height and UBM structure are the important issues that would show the significant effects on the reliability performances of solder micro bump interconnection. In this study, effects of bump height and UBM structure on the reliability properties of lead-free solder micro interconnections with a pitch of 60μm were discussed. The chip-to-chip test vehicle having more than 4290 solder micro bump interconnections with a bump pitch of 60μm was used in this study. To evaluate the effects of bump height and UBM structure on the reliability performance of micro joints, two groups of solder joint were made. The first group of micro joints had a total bump height of 29μm. In this group, Cu/Sn/Cu joint with a thickness of 7μm/15μm/7um, Cu/Sn/Ni/Cu joint having a thickness of 7μm/15μm/2μm/5μm and Cu/Ni/Sn/Ni/Cu joint with a thickness of 5μm/2μm/15μm/2um/5μm were selected. The second group of micro joints had a total bump height of 24μm. In this group, Cu/Sn/Cu joint having a thickness of 7μm/10μm/7um, Cu/Sn/Ni/Cu joint with a thickness of 7μm/10μm/2μm/5μm and Cu/Ni/Sn/Ni/Cu joint having a thickness of 5μm/2μm/10μm/2um/5μm were chosen. We used the fluxless thermocompression bonding process to form these two groups of micro joints. After bonding process, the chip stack was assembled by capillary-type underfill. Reliability tests of temperature cycling test- (TCT), high temperature storage (HTS) and electromigration test (EM) were selected to assess the effect of bump height and UBM structure on the reliability properties of those two groups of solder micro bump interconnections.
Keywords :
copper; electromigration; integrated circuit bonding; integrated circuit interconnections; integrated circuit packaging; integrated circuit reliability; integrated circuit testing; lead bonding; nickel; solders; three-dimensional integrated circuits; tin; Cu-Ni-Sn-Ni-Cu; Cu-Sn-Cu; Cu-Sn-Ni-Cu; UBM structure; bump height; capillary-type underfill; chip-to-chip test vehicle; electromigration test; fluxless thermocompression bonding process; high temperature storage; lead-free solder microinterconnections; microelectronic packaging; reliability performance; solder microbump interconnections; temperature cycling test; three dimensional integration circuits; High-temperature superconductors; Joints; Microstructure; Nickel; Reliability; Resistance; Tin; electromigration test; high temperature storage; reliability test; solder micro bumps; temperature cycling test; under bump metallurgy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Packaging (ICEP), 2014 International Conference on
Conference_Location :
Toyama
Print_ISBN :
978-4-904090-10-7
Type :
conf
DOI :
10.1109/ICEP.2014.6826753
Filename :
6826753
Link To Document :
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