Segregated microstructure growth in sputtered Co-Cr films

Author

Maeda, Yasushi ; Takahashi, Masaya

Author_Institution

Basic Res. Lab., NTT, Ibaraki, Japan

Volume

24

Issue

6

fYear

1988

fDate

11/1/1988 12:00:00 AM

Firstpage

3012

Lastpage

3014

Abstract

The growth process of a latent segregated microstructure called the CP (chrysanthemumlike pattern) has been investigated as a function of film thickness in sputtered Co-21.5 at.% Cr films. As film growth proceeds, each crystallite exhibits CP structure development with a periodical stripe pattern. Only crystallites with Cr-rich cores survive. This is related to Cr segregation at the grain boundaries. The CP structure growth process is explained using a model based on (1) a phase separation process restricted by grain boundary and surface diffusion, and (2) grain boundary Cr enrichment at the latter stage of segregation. The correlation between CP structure growth and the change in magnetic properties strongly indicates that the perpendicularly formed CP structure is responsible for the magnetic properties of Co-Cr films

Keywords

chromium alloys; cobalt alloys; coercive force; crystal microstructure; ferromagnetic properties of substances; grain boundaries; magnetic anisotropy; magnetic hysteresis; magnetic recording; magnetic thin films; segregation; sputtered coatings; Cr segregation; chrysanthemumlike pattern; coercive force; crystallites; film growth; film thickness; grain boundaries; hysteresis; latent segregated microstructure; magnetic anisotropy; magnetic properties; periodical stripe pattern; phase separation; sputtered Co-Cr films; surface diffusion; Chromium; Crystal microstructure; Crystallization; Grain boundaries; Magnetic anisotropy; Magnetic films; Magnetic properties; Perpendicular magnetic anisotropy; Saturation magnetization; Substrates;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.92318

Filename

92318