• DocumentCode
    1489816
  • Title

    Zero magnetostriction iron films

  • Author

    Ishiwata, N. ; Wakabayashi, C. ; Matsumoto, T.

  • Author_Institution
    NEC Home Electron. Ltd., Kawasaki, Japan
  • Volume
    24
  • Issue
    6
  • fYear
    1988
  • fDate
    11/1/1988 12:00:00 AM
  • Firstpage
    3078
  • Lastpage
    3080
  • Abstract
    Iron films with low coercive force and near-zero magnetostriction have been prepared by ion beam sputtering. With an increase in Ar ion acceleration voltage, the dominant crystalline orientation of the films changed from the (100) to the (110) plane. The saturation magnetostriction constant, λs, changed from positive to negative values, corresponding to the orientation change. The λs of annealed films, whose lattice constants agreed well with those of the bulk, were close to the calculated values. The coercive force had a minimum of about 2 Oe near zero λs. The results indicate that the soft magnetic properties of iron films can be improved by reducing λs, which in turn is controlled by the acceleration voltage of the ion-beam-sputtering system
  • Keywords
    coercive force; crystal orientation; ferromagnetic properties of substances; iron; magnetic thin films; magnetostriction; sputtered coatings; Fe films; crystalline orientation; ion acceleration voltage; ion beam sputtering; lattice constants; low coercive force; near-zero magnetostriction; saturation magnetostriction constant; soft magnetic properties; Acceleration; Argon; Coercive force; Crystallization; Ion beams; Iron; Magnetic films; Magnetostriction; Sputtering; Voltage;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.92340
  • Filename
    92340