DocumentCode
1489816
Title
Zero magnetostriction iron films
Author
Ishiwata, N. ; Wakabayashi, C. ; Matsumoto, T.
Author_Institution
NEC Home Electron. Ltd., Kawasaki, Japan
Volume
24
Issue
6
fYear
1988
fDate
11/1/1988 12:00:00 AM
Firstpage
3078
Lastpage
3080
Abstract
Iron films with low coercive force and near-zero magnetostriction have been prepared by ion beam sputtering. With an increase in Ar ion acceleration voltage, the dominant crystalline orientation of the films changed from the (100) to the (110) plane. The saturation magnetostriction constant, λs, changed from positive to negative values, corresponding to the orientation change. The λs of annealed films, whose lattice constants agreed well with those of the bulk, were close to the calculated values. The coercive force had a minimum of about 2 Oe near zero λs. The results indicate that the soft magnetic properties of iron films can be improved by reducing λs, which in turn is controlled by the acceleration voltage of the ion-beam-sputtering system
Keywords
coercive force; crystal orientation; ferromagnetic properties of substances; iron; magnetic thin films; magnetostriction; sputtered coatings; Fe films; crystalline orientation; ion acceleration voltage; ion beam sputtering; lattice constants; low coercive force; near-zero magnetostriction; saturation magnetostriction constant; soft magnetic properties; Acceleration; Argon; Coercive force; Crystallization; Ion beams; Iron; Magnetic films; Magnetostriction; Sputtering; Voltage;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.92340
Filename
92340
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