Apodized Silicon-on-Insulator Bragg Gratings

Author

Simard, Alexandre D. ; Belhadj, Nezih ; Painchaud, Yves ; LaRochelle, Sophie

Author_Institution

Dept. of Electr. Commun. Eng., Univ. Laval, Montreal, QC, Canada

Volume

24

Issue

12

fYear

2012

fDate

6/15/2012 12:00:00 AM

Firstpage

1033

Lastpage

1035

Abstract

An accurate control of the apodization profile is still an issue for integrated Bragg grating filters fabricated in silicon-on-insulator because of the high modal confinement of these waveguides. In this letter, we present two fabrication-friendly apodization techniques that are compatible with deep UV lithography and can be used in mass-production of photonic-integrated circuits. These techniques are reliable even for weak effective index modulation amplitude, thus opening the door to the fabrication of long and elaborate grating structures.

Keywords

Bragg gratings; integrated optics; optical control; optical fabrication; optical filters; optical modulation; optical waveguides; silicon-on-insulator; ultraviolet lithography; Si; apodization profile control; apodized silicon-on-insulator; deep UV lithography; effective index modulation amplitude; elaborate grating structures; fabrication-friendly apodization techniques; high modal confinement; integrated Bragg grating filters; long grating structures; mass-production; photonic integrated circuits; waveguides; Bragg gratings; Couplings; Fabrication; Gratings; Indexes; Optical waveguides; Reflection; Apodized grating; Bragg grating; integrated optics; optical filter; silicon-on-insulator;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2012.2194278

Filename

6180185