DocumentCode :
1491821
Title :
Reexamination of SRAM Cell Write Margin Definitions in View of Predicting the Distribution
Author :
Makino, Hiroshi ; Nakata, Shunji ; Suzuki, Hirotsugu ; Mutoh, Shin Ichiro ; Miyama, Masayuki ; Yoshimura, Tsutomu ; Iwade, Shuhei ; Matsuda, Yoshio
Author_Institution :
Fac. of Inf. Sci. & Technol., Osaka Inst. of Technol., Hirakata, Japan
Volume :
58
Issue :
4
fYear :
2011
fDate :
4/1/2011 12:00:00 AM
Firstpage :
230
Lastpage :
234
Abstract :
Four definitions of static random access memory (SRAM) cell write margins (WMs) were reexamined by analyzing the dependence of the WM on the SRAM cell transistor threshold voltages (Vth´s) in order to find a preferable definition. The WM is expected to obey the normal distribution if the differential coefficients of the WM to Vth´s are constant over a wide range of Vth variations. This means that the write yield can be easily predicted by a small number of measured samples. Using SPICE in 45-nm technology, we examined which definition had Vth linearity, as well as giving an accurate write limit. The distribution predicted from the linearity was verified by the Monte Carlo simulation. As a result, the definition proposed by Gierczynski was found to be the most suitable definition for predicting the distribution and the write yield.
Keywords :
Monte Carlo methods; SPICE; SRAM chips; Monte Carlo simulation; SPICE; SRAM cell transistor; SRAM cell write margin definition; distribution prediction; size 45 nm; static random access memory; threshold voltage; write yield; Gaussian distribution; Linearity; Random access memory; Stability analysis; Threshold voltage; Transistors; Wireless sensor networks; Static random access memory (SRAM); Vth fluctuation; WM distribution; variance; write margin (WM);
fLanguage :
English
Journal_Title :
Circuits and Systems II: Express Briefs, IEEE Transactions on
Publisher :
ieee
ISSN :
1549-7747
Type :
jour
DOI :
10.1109/TCSII.2011.2124531
Filename :
5746620
Link To Document :
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