Microlithography of high-temperature superconducting films: laser ablation vs. wet etching

Author

Ballentine, P.H. ; Kadin, A.M. ; Fisher, M.A. ; Mallory, D.S. ; Donaldson, W.R.

Author_Institution

Rochester Univ., NY, USA

Volume

25

Issue

2

fYear

1989

fDate

3/1/1989 12:00:00 AM

Firstpage

950

Lastpage

953

Abstract

Narrow lines and microbridge structures have been etched in sputtered superconducting films of Y-Ba-Cu-O by variations of two methods. The first uses standard photolithography followed by wet etching in weak acid. The second uses a maskless process involving focused pulsed YAG (yttrium-aluminium-garnet) laser together with a computer-controlled x-y stage to produce local ablation of the superconducting film. Issues relating to limits of resolution, annealing of films, and degradation of superconducting properties are critically discussed for the two approaches

Keywords

barium compounds; etching; high-temperature superconductors; laser beam machining; photolithography; sputtered coatings; superconducting junction devices; superconducting thin films; yttrium compounds; YAG laser; YAl5O12; YBaCuO; annealing; computer-controlled x-y stage; high temperature superconductor; high-temperature superconducting films; laser ablation; maskless process; microbridge structures; microlithography; narrow lines; photolithography; resolution; sputtered superconducting films; wet etching; Annealing; Degradation; High temperature superconductors; Laser ablation; Lithography; Optical pulses; Sputter etching; Superconducting films; Wet etching; Yttrium barium copper oxide;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.92445

Filename

92445