Title :
Characterization of YBaCuO and ErBaCuO thin films deposited on silicon and gallium arsenide substrates
Author :
Chin, David K. ; Van Duzer, Theodore ; Hansen, William L. ; Yu, Kin M. ; Stickle, William F. ; Lee, Soo Y. ; Murdock, Bruce
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
fDate :
3/1/1989 12:00:00 AM
Abstract :
YBaCuO and ErBaCuO films have been deposited on Si substrates with and without a ZrO2 buffer layer and on GaAs substrates by RF diode sputtering from stoichiometric oxide targets. The films and interface between the films and semiconductor substrates are analyzed by Rutherford backscattering spectrometry (RBS), X-ray fluorescence spectroscopy (XRF), Auger electron spectroscopy (AES), energy dispersive X-ray spectrometry (EDAX), and scanning electron microscopy (SEM). The films grown on Si substrates with a ZrO2 buffer layer show superconductivity above 65 K, and no significant interaction at the interface is observed. High-Tc films can be obtained either by slow-furnace annealing or by rapid heat-pulse annealing. No significant interaction is observed between YBaCuO (ErBaCuO) and GaAs after rapid thermal annealing at temperatures below 750°C
Keywords :
Auger effect; Rutherford backscattering; X-ray chemical analysis; X-ray fluorescence analysis; barium compounds; erbium compounds; high-temperature superconductors; scanning electron microscope examination of materials; sputtered coatings; yttrium compounds; Auger electron spectroscopy; ErBaCuO; GaAs; RF diode sputtering; Rutherford backscattering spectrometry; Si; X-ray fluorescence spectroscopy; YBaCuO; energy dispersive X-ray spectrometry; high temperature superconductor; rapid heat-pulse annealing; scanning electron microscopy; slow-furnace annealing; stoichiometric oxide targets; superconductivity; Buffer layers; Electrons; Gallium arsenide; Rapid thermal annealing; Semiconductor films; Spectroscopy; Sputtering; Substrates; Superconducting films; Yttrium barium copper oxide;
Journal_Title :
Magnetics, IEEE Transactions on
