DocumentCode :
1493547
Title :
Experimental Method to Extract Effective Channel Length of Nanoscale n-MOSFETs
Author :
Lee, Nam-Hyun ; Choi, Hwan-Wook ; Kang, Heesung ; Kang, Bongkoo
Author_Institution :
Dept. of Electr. Eng., Pohang Univ. of Sci. & Technol., Pohang, South Korea
Volume :
30
Issue :
11
fYear :
2009
Firstpage :
1191
Lastpage :
1193
Abstract :
An experimental method of extracting the effective channel length Leff from measured gate tunneling current (Ig) of nanoscale n-MOSFETs is proposed. The tunneling current from gate to the source and drain (Igsd) was measured while applying a reverse bias to the substrate, and it was corrected for the depletion effect of the source/drain junctions. The gate tunneling current to the substrate (Igc) was obtained by subtracting Igsd from Ig. Leff was calculated using a linear extrapolation of the Igc versus gate length plot. The proposed method is a very simple and quite accurate method of extracting Leff which does not require any additional assumptions and parameter extraction.
Keywords :
MOSFET; extrapolation; nanoelectronics; semiconductor junctions; tunnelling; depletion effect; effective channel length; gate tunneling current; linear extrapolation; nanoscale n-MOSFET; parameter extraction; source-drain junctions; Effective channel length; MOSFET; gate tunneling current; gate-source/drain overlap length;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2009.2030907
Filename :
5280281
Link To Document :
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