DocumentCode
1494174
Title
Interview
Author
Yuan, Xibo
Author_Institution
IBM
Volume
46
Issue
10
fYear
2010
Firstpage
666
Lastpage
666
Abstract
Dr Xiaobin Yuan from the Microelectronics Division of IBM and author of the Letter ´Transistor mismatch in 32 nm high-k metal-gate process´ on page 708 tells us more about his research into advanced process technologies.
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el.2010.9047
Filename
5466330
Link To Document