مرکز منطقه ای اطلاع رساني علوم و فناوري

DocumentCode :

1494174

Title :

Interview

Author :

Yuan, Xibo

Author_Institution :

IBM

Volume :

Issue :

fYear :

2010

Firstpage :

666

Lastpage :

666

Abstract :

Dr Xiaobin Yuan from the Microelectronics Division of IBM and author of the Letter ´Transistor mismatch in 32 nm high-k metal-gate process´ on page 708 tells us more about his research into advanced process technologies.

fLanguage :

English

Journal_Title :

Electronics Letters

Publisher :

iet

ISSN :

0013-5194

Type :

jour

DOI :

10.1049/el.2010.9047

Filename :

5466330

Link To Document :

https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1494174