• DocumentCode
    1494272
  • Title

    Comparison of Ge Surface Passivation Between \\hbox {SnGeO}_{x} Films Formed by Oxidation of Sn/Ge and </h1></div></div> </li> <li class='list-group-item border-0 py-3 px-0'> <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Author</span></div><div class='col-12 col-md-9 leftDirection leftAlign'><h2 class='mb-0 fw-semibold'>Wu, Yung-Hsien ; Wu, Min-Lin ; Lyu, Rong-Jhe ; Wu, Jia-Rong ; Lin, Chia-Chun ; Chen, Lun-Lun</h2></div></div> </li> <li class='list-group-item border-0 py-3 px-0'> <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Author_Institution</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>Dept. of Eng. & Syst. Sci., Nat. Tsing Hua Univ., Hsinchu, Taiwan</div></div> </li> <li class='list-group-item border-0 py-3 px-0'> <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Volume</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>32</div></div> </li> <li class='list-group-item border-0 py-3 px-0'> <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Issue</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>5</div></div> </li> <li class='list-group-item border-0 py-3 px-0'> <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>fYear</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>2011</div></div> </li> <li class='list-group-item border-0 py-3 px-0'> <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>fDate</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>5/1/2011 12:00:00 AM</div></div> </li> <li class='list-group-item border-0 py-3 px-0'> <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Firstpage</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>611</div></div> </li> <li class='list-group-item border-0 py-3 px-0'> <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Lastpage</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>613</div></div> </li> <li class='list-group-item border-0 py-3 px-0'> <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Abstract</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>SnGeO<i>x</i> films formed by thermal oxidation of Sn/Ge and SnGe<i>x</i>/Gestructures were confirmed by X-ray photoelectron spectroscopy and explored to investigate the capability of passivation for Ge MOS devices. It is found that Sn incorporation into germanium oxide is effective in suppressing the formation of volatile GeO. For SnGeO<i>x</i> films formed by oxidation of SnGe<i>x</i>/Ge structures, due to fewer dislocations between SnGe<i>x</i> and Ge, it enjoys an interface trap density of 2.1 × 10<sup>11</sup> cm<sup>-2</sup> · eV<sup>-1</sup>, which is lower than those oxidized from Sn/Ge structures. Furthermore, the films also demonstrate desirable electrical characteristics in terms of tiny frequency dispersion and small hysteresis in capacitance measurement, a low leakage current of 9.3 × 10<sup>-10</sup> A/cm<sup>2</sup> at a gate voltage of - 1 V with an effective oxide thickness of 3.6 nm, and a good bias temperature instability of 15-mV flatband voltage shift at 85°C after 12.5 MV/cm stress for 1000 s.</div></div> </li> <li class='list-group-item border-0 py-3 px-0'> <div class='row g-0 align-items-center mb-2'><div class='col-12 col-md-3 fullRecLabelEnglish fw-bold mb-2 mb-md-0'><span class='text-muted small'>Keywords</span></div><div class='col-12 col-md-9 leftDirection leftAlign'>X-ray spectroscopy; germanium compounds; interface states; oxidation; passivation; photoelectron spectroscopy; tin compounds; SnGeO; X-ray photoelectron spectroscopy; interface trap density; size 3.6 nm; surface passivation; temperature 85 degC; thermal oxidation; time 1000 s; voltage -1 V; voltage 15 mV; Dielectrics; Frequency measurement; Logic gates; Oxidation; Passivation; Temperature measurement; Tin; <formula formulatype=$ hbox{SnGeO}_{x}$; Bias temperature instability (BTI); Ge surface passivation; interface trap density; leakage current;

  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2011.2118735
  • Filename
    5750028
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1494272