DocumentCode :
1494888
Title :
Experiment of filed-effect transistor with a channel made of NbN granular thin film
Author :
Sugahara, M. ; Yoshikawa, N. ; Murakami, T.
Author_Institution :
Fac. of Eng., Yokohama Nat. Lab., Japan
Volume :
25
Issue :
2
fYear :
1989
fDate :
3/1/1989 12:00:00 AM
Firstpage :
1270
Lastpage :
1273
Abstract :
The authors describe an experimental study of the effect of an electric field on a granular superconducting thin film using a three-terminal device which has the structure of a field-effect transistor, with the channel made of NbN granular thin film. When the gate voltage is varied at low temperature, the channel resistance shows a cyclical variation of more than one cycle. The maximum resistance variation observed at 4.2 K is about 40% . The voltage period for the resistance variation seems to correspond to the induction of the electric pair charge, 2e, on a grain. It is concluded that this result is due to a new microscopic quantum effect dual to the Josephson effect and could lead to a novel three-terminal superconductor device
Keywords :
field effect transistors; niobium compounds; superconducting junction devices; superconducting thin films; Josephson effect; NbN granular thin film; channel resistance; electric field; electric pair charge; filed-effect transistor; gate voltage; maximum resistance variation; microscopic quantum effect; three-terminal device; voltage period; Electric resistance; FETs; Granular superconductors; Josephson effect; Microscopy; Superconducting thin films; Temperature; Thin film devices; Thin film transistors; Voltage;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.92527
Filename :
92527
Link To Document :
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