DocumentCode :
1494936
Title :
EUV edging out rivals as next-generation IC fab tool
Author :
Roush, Wade
Volume :
38
Issue :
6
fYear :
2001
fDate :
6/1/2001 12:00:00 AM
Firstpage :
25
Lastpage :
26
Keywords :
Atom optics; Gas lasers; Integrated circuit testing; Laboratories; Lithography; Mirrors; Surface emitting lasers; Transistors; Ultraviolet sources; Xenon;
fLanguage :
English
Journal_Title :
Spectrum, IEEE
Publisher :
ieee
ISSN :
0018-9235
Type :
jour
DOI :
10.1109/MSPEC.2001.925276
Filename :
925276
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1494936
