Characteristics of Nb-based Josephson junctions at a temperature below 1 K

Author

Ishibashi, K. ; Takeno, K. ; Oae, Y. ; Sakae, T. ; Matsumoto, Y. ; Katase, A. ; Takada, S. ; Akoh, H. ; Nakagawa, H.

Author_Institution

Dept. of Nucl. Eng., Kyushu Univ., Fukuoka, Japan

Volume

25

Issue

2

fYear

1989

fDate

3/1/1989 12:00:00 AM

Firstpage

1354

Lastpage

1357

Abstract

A lithographic technique for Josephson LSI (large scale integrated) circuits was applied to the production of a superconducting tunnel junction for radiation detection. Nb-Al/aluminum oxide/Nb tunnel junctions with different junction sizes and barrier oxidation times have been fabricated. The current-voltage curves were measured in the temperature range from 4.2 to 0.45 K. The junctions showed some amounts of leakage current, which remained below 2 K. The behavior of the leakage current was successfully understood from its experimental dependence on the junction size

Keywords

Josephson effect; aluminium; aluminium compounds; cryogenics; integrated circuit technology; large scale integration; leakage currents; lithography; niobium; radiation detection and measurement; superconducting junction devices; type I superconductors; type II superconductors; 0.45 to 4.2 K; Josephson LSI; Josephson junctions; Nb-Al-AlO_x-Nb; barrier oxidation times; cryostat; current-voltage curves; junction size; leakage current; lithographic technique; radiation detection; superconducting tunnel junction; Aluminum oxide; Josephson junctions; Large scale integration; Leakage current; Niobium; Oxidation; Production; Radiation detector circuits; Superconducting integrated circuits; Temperature measurement;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.92547

Filename

92547