DocumentCode :
1496286
Title :
Design and Optimization of Superjunction Collectors for Use in High-Speed SiGe HBTs
Author :
Yuan, Jiahui ; Cressler, John D.
Author_Institution :
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
Volume :
58
Issue :
6
fYear :
2011
fDate :
6/1/2011 12:00:00 AM
Firstpage :
1655
Lastpage :
1662
Abstract :
After reviewing the various mechanisms causing breakdown in bipolar transistors, we present a novel collector design for silicon-germanium heterojunction bipolar transistors (SiGe HBTs). The design improves the well-known speed/breakdown voltage tradeoff in SiGe HBTs for radio-frequency (RF) and millimeter-wave applications. Applying multiple alternating p- and n-type layers (a superjunction) deep in the collector-base (CB) space-charge region (SCR) alters the electric field and electron temperature in the CB junction. Consequently, impact ionization is suppressed, whereas the width of the CB SCR is not increased, and therefore, the breakdown voltages BVCEO and BVCEO are increased, with no degradation in the device speed or RF performance. For a fixed alternating-current performance, BVCEO is improved by 0.33 V, producing a SiGe HBT with fT = 101 GHz, fmax = 351 GHz, and BVCEO = 3.0 V, as predicted by calibrated DESSIS technology computer-aided design simulations. Concerns with regard to the influence of thermal cycles associated with fabrication are considered, and a more practical doping profile is proposed to simplify the use of superjunctions. The proposed structure is also contrasted with other approaches from the literature.
Keywords :
Ge-Si alloys; heterojunction bipolar transistors; optimisation; SiGe HBT; design; heterojunction bipolar transistors; optimization; superjunction collectors; Doping; Heterojunction bipolar transistors; Impact ionization; Junctions; Silicon carbide; Silicon germanium; Thyristors; Breakdown voltage; cutoff frequency; heterojunction bipolar transistor (HBT); operation speed; silicon–germanium; superjunction;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2011.2128872
Filename :
5751666
Link To Document :
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