• DocumentCode
    1496804
  • Title

    Micromachined thermal radiation emitter from a commercial CMOS process

  • Author

    Parameswaran, M. ; Robinson, Alexander M. ; Blackburn, David L. ; Gaitan, Michael ; Geist, Jon

  • Author_Institution
    Sch. of Eng. Sci., Simon Fraser Univ., Burnaby, BC, Canada
  • Volume
    12
  • Issue
    2
  • fYear
    1991
  • Firstpage
    57
  • Lastpage
    59
  • Abstract
    Fabrication of thermally isolated micromechanical structures capable of generating thermal radiation for dynamic thermal scene simulation (DTSS) is described. Complete compatibility with a commercial CMOS process is achieved through design of a novel, but acceptable, layout for implementation by the CMOS foundry using its regular process sequence. Following commercial production and delivery of the CMOS chips, a single maskless etch in an aqueous ethylemediamine-pyrocatechol mixture is performed to realize the micromechanical structures. The resulting structures are suspended plates consisting of polysilicon resistors encapsulated in the field and CVD (chemical-vapor-deposited) oxides available in the CMOS process. The plates are suspended by aluminum heater leads that are also encapsulated in the field and CVD oxides. Studies of the suitability of these structures for DTSS have been initiated, and early favorable results are reported.<>
  • Keywords
    display devices; heat radiation; infrared sources; integrated circuit technology; thin film resistors; 2D arrays; Al heater leads; CVD oxides; DTSS; aqueous ethylemediamine-pyrocatechol mixture; compatibility with commercial CMOS process; dynamic IR scene generation; dynamic thermal scene simulation; fabrication; generating thermal radiation; micromachined thermal radiation emitter; oxide encapsulation; polycrystalline Si resistors; polysilicon resistors; regular process sequence; single maskless etch; suspended plates; thermally isolated micromechanical structures; CMOS process; Chemical processes; Chemical vapor deposition; Etching; Fabrication; Foundries; Layout; Micromechanical devices; Production; Resistors;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.75702
  • Filename
    75702