DocumentCode :
1496858
Title :
Effects of Negative-Bias Operation and Optical Stress on Dark Current in CMOS Image Sensors
Author :
Watanabe, Takashi ; Park, Jong-Ho ; Aoyama, Satoshi ; Isobe, Keigo ; Kawahito, Shoji
Author_Institution :
Brookman Technol., Inc., Hamamatsu, Japan
Volume :
57
Issue :
7
fYear :
2010
fDate :
7/1/2010 12:00:00 AM
Firstpage :
1512
Lastpage :
1518
Abstract :
A negative-bias operation of the transfer gate has revealed a major origin of dark current defects of CMOS image sensors. Charge injection from the photodiode to the substrate at the negative-bias operation has been avoided by an improved well structure. A strong visible light has been observed to cause damage with an increase in the dark current under the normal operating condition, and the damage has been annealed in the power-off mode. This indicates that the strong light possibly causes a threshold voltage shift, which is explained by the photon-assisted tunneling or emission mechanisms. Multiple stress-and-anneal cycles have been found to cause an optical hardening effect, which can be explained by immobile trapped holes.
Keywords :
CMOS image sensors; photodiodes; tunnelling; CMOS image sensor; charge injection; dark current defect; emission mechanism; immobile trapped hole; negative-bias operation; optical hardening effect; optical stress; photodiode; photon-assisted tunneling; power-off mode; stress-and-anneal cycle; substrate; threshold voltage shift; transfer gate; visible light; Annealing; CMOS image sensors; Charge carrier processes; Dark current; Optical sensors; Photodiodes; Stimulated emission; Stress; Threshold voltage; Tunneling; CMOS image sensor (CIS); dark current; negative bias; optical stress; tunneling;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2010.2049220
Filename :
5467174
Link To Document :
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