Title :
Tunable microwave load based on biased photoinduced plasma in silicon
Author :
Boyer, Bertrand ; Haidar, Jihad ; Vilcot, Anne ; Bouthinon, Michel
Author_Institution :
CNRS, Inst. Nat. Polytech. de Grenoble, France
fDate :
8/1/1997 12:00:00 AM
Abstract :
The frequency tuning of a quarter-wave resonator using an optoelectronic control is reported. Sharp notch characteristics with a small decibel-insertion loss and tunable frequency with matching better than 45 dB are obtained by varying both the optical power and the DC bias. The measured frequency shift is more than 60% below the dark resonant frequency and is carried out without altering the shape of the response. The biased photoinduced plasma (BPP) loading the open terminated microstrip line is then analyzed by comparing microwave simulations and measurements. The deduced complex load equivalent to this biased photoinduced plasma is then confirmed by semiconductor simulations. Results show the great possibilities offered by this BPP load (BPPL), which can be easily and widely tuned by means of a simple optoelectronic control. The frequency bandwidth of tuning is limited by the geometrical parameters and may be extended to millimeter-wave operation
Keywords :
microwave devices; photoconducting devices; resonators; semiconductor plasma; silicon; tuning; DC bias variation; Si; biased photoinduced plasma; complex load; frequency tuning; insertion loss; microwave simulation; open terminated microstrip line; optical power variation; optoelectronic control; quarter-wave resonator; semiconductor simulations; sharp notch characteristics; tunable frequency; tunable microwave load; Frequency measurement; Microstrip; Optical losses; Optical resonators; Optical tuning; Plasma measurements; Plasma properties; Plasma simulation; Resonant frequency; Shape measurement;
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on