DocumentCode
1498207
Title
Excitation of the half-frequency of the input signal in the response of an antenna immersed in a plasma
Author
Linh, Ngo Phong ; Nachman, Manfred
Author_Institution
Dept. of Electr. Eng., Ecole Polytechnique, Montreal, Que., Canada
Volume
18
Issue
4
fYear
1990
fDate
8/1/1990 12:00:00 AM
Firstpage
717
Lastpage
724
Abstract
The nonlinear response of a cylindrical monopole antenna immersed in a steady-state collisionless magnetic-field-free plasma and driven by a single-frequency RF source is investigated. The thickness of the ion sheath surrounding the antenna is controlled by a DC bias applied to the latter. It is found that at frequencies of the driving signal close to twice the frequency of a sheath wave resonance, the 1/2-subharmonic is excited, provided that the input power level is sufficiently high. The dependence of this process on the sheath thickness and on the electron plasma density is studied in the vicinity of several sheath wave resonances. This nonlinear effect is interpreted as a parametric excitation due to the periodic modulation of the sheath thickness, and hence its capacitance, by the applied RF signal. A similar effect can be obtained by replacing the antenna-sheath-plasma structure in the measuring circuit by a variable capacitance diode. A numerical analysis of the differential equation describing the current waveform in a microwave network modeling the antenna-sheath-plasma system is presented. It confirms the fact that a periodically modulated capacitance embedded in a linear circuit is responsible for the observed excitation of the half-frequency of the input signal
Keywords
antennas in plasma; plasma density; plasma radiofrequency heating; plasma sheaths; 1/2-subharmonic; antenna-sheath-plasma system; collisionless plasma; current waveform; cylindrical monopole antenna; differential equation; electron plasma density; ion sheath; magnetic-field-free plasma; sheath thickness; sheath wave resonance frequency; single-frequency RF source; variable capacitance diode; Capacitance; Electrons; Magnetic resonance; Plasma density; Plasma sheaths; Plasma sources; Plasma waves; Radio frequency; Steady-state; Thickness control;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.57526
Filename
57526
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