• DocumentCode
    1498735
  • Title

    Magnetization Process in Dilute Magnetic Oxides

  • Author

    Coey, J.M.D. ; Mlack, Jerome T. ; Venkatesan, M. ; Stamenov, P.

  • Author_Institution
    Sch. of Phys. & CRANN, Trinity Coll., Dublin, Ireland
  • Volume
    46
  • Issue
    6
  • fYear
    2010
  • fDate
    6/1/2010 12:00:00 AM
  • Firstpage
    2501
  • Lastpage
    2503
  • Abstract
    Thin films of dilute magnetic oxides often exhibit high-temperature ferromagnetism with magnetization curves of the form M ¿ Ms tanh (H/H0); the curves are practically anhysteretic and temperature-independent below room temperature. The absence of temperature-dependent coercivity indicates that the magnetization process is dominated by magnetic dipole interactions, not by magnetocrystalline anisotropy. In a model of ferromagnetic grain boundaries, H0 ¿ 0.14M0, where M0 is the magnetization of the ferromagnetic regions. Quantitative analysis of more than 200 films of different oxides reveals that only a few percent of the volume of these films is magnetically ordered.
  • Keywords
    dilute magnetic materials; ferromagnetic materials; grain boundaries; indium compounds; magnetic moments; magnetic thin films; magnetisation; manganese; tin compounds; ITO:Mn; anhysteretic magnetization curves; dilute magnetic oxide thin films; ferromagnetic grain boundaries; high-temperature ferromagnetism; magnetic dipole interactions; magnetically ordered films; temperature-independent magnetization curves; Ceramics; Magnetic anisotropy; Magnetic films; Magnetic materials; Magnetization processes; Nanoparticles; Paramagnetic materials; Perpendicular magnetic anisotropy; Temperature; Zinc oxide; Anisotropy; dilute magnetic oxides; magnetization;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.2010.2041910
  • Filename
    5467498