• DocumentCode
    1499038
  • Title

    Clustered defects in IC fabrication: Impact on process control charts

  • Author

    Friedman, David J. ; Albin, Susan L.

  • Author_Institution
    AT&T Bell Labs., Murray Hill, NJ, USA
  • Volume
    4
  • Issue
    1
  • fYear
    1991
  • fDate
    2/1/1991 12:00:00 AM
  • Firstpage
    36
  • Lastpage
    42
  • Abstract
    In IC fabrication, standard process control charts for defects often sound many false alarms, i.e. the chart incorrectly indicates that the process is out of control. It is pointed out that when non-Poisson behavior is encountered in defect data, it is necessary to determine whether this is due to an out-of-control manufacturing process or a manufacturing or data collection procedure that yields clustered defect counts. A procedure that includes the outlier removal method to discriminate between clustered defect data and a process that is out of control is proposed, and its application to two sets of real-world data is shown. One is an example from IC manufacturing where true clustering exists, and the other is a manufacturing example where persistent out-of-control conditions give the appearance of clustering. Simulation results indicate that the procedure works well within reasonable boundaries. A method for constructing defect control charts for processes that yield clustered defects is also presented
  • Keywords
    integrated circuit manufacture; statistical process control; IC fabrication; Impact on process control charts; appearance of clustering; clustered defect counts; clustered defect data; constructing defect control charts; false alarms; persistent out-of-control conditions; processes that yield clustered defects; real-world data; standard process control charts; Acoustical engineering; Computer industry; Control charts; Fabrication; Helium; Industrial control; Job shop scheduling; Manufacturing processes; Process control; Time measurement;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/66.75850
  • Filename
    75850