Selective electroless plating-A new technique for GaAs MMICs

Author

Choudhury, Debabani ; Bhatgadde, L.G. ; Mahapatra, S.

Author_Institution

Indian Inst. of Technol., Bombay, India

Volume

4

Issue

1

fYear

1991

fDate

2/1/1991 12:00:00 AM

Firstpage

69

Lastpage

72

Abstract

A simple, cost-effective processing technique, selective electroless plating, is proposed for GaAs monolithic microwave integrated circuits (MMICs). Microwave measurements show that the attenuation properties of transmission lines fabricated by this processing technique are comparable to the attenuation properties of lines fabricated by the traditional evaporation lift-off technique

Keywords

III-V semiconductors; MMIC; electroless deposition; gallium arsenide; integrated circuit manufacture; metallisation; strip lines; waveguides; CPW; GaAs; MMICs; attenuation properties of transmission lines; coplanar waveguide; cost-effective processing technique; microstrip lines; microwave properties; monolithic microwave integrated circuits; selective electroless plating; semiconductor; Attenuation measurement; Distributed parameter circuits; Gallium arsenide; Integrated circuit measurements; MMICs; Microwave integrated circuits; Microwave measurements; Microwave theory and techniques; Monolithic integrated circuits; Transmission line measurements;

fLanguage

English

Journal_Title

Semiconductor Manufacturing, IEEE Transactions on

Publisher

ieee

ISSN

0894-6507

Type

jour

DOI

10.1109/66.75856

Filename

75856