DocumentCode :
1499142
Title :
A Simulation Study of Colpitts Oscillator Reliability and Variability
Author :
Yuan, Jiann-shiun ; Chen, Shuyu
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Univ. of Central Florida, Orlando, FL, USA
Volume :
12
Issue :
3
fYear :
2012
Firstpage :
576
Lastpage :
581
Abstract :
Nanoscale CMOS reliability and process variation effect on the LC Colpitts oscillator has been examined. Mixed-mode device and circuit simulation is used to investigate the physical insight of impact ionization to the Colpitts oscillator. An analytical equation of phase noise as a function of offset frequency, transistor parameters, and body bias has been derived. The analytical predictions are in good agreement with ADS simulation results. An adaptive body bias to minimize process variation effect on the Colpitts oscillator has also been proposed. The adaptive body bias technique effectively reduces the hot electron effect and process variability on the Colpitts oscillator performance, as supported by Monte Carlo simulation results.
Keywords :
Monte Carlo methods; circuit reliability; oscillators; phase noise; transistors; ADS simulation; Colpitts oscillator reliability; LC Colpitts oscillator; Monte Carlo simulation; adaptive body bias technique; circuit simulation; hot electron effect; mixed-mode device; nanoscale CMOS reliability; offset frequency function; phase noise analytical equation; process variation effect; transistor parameters; Adaptation models; Impact ionization; Integrated circuit modeling; Integrated circuit reliability; Phase noise; Body bias; Colpitts oscillator; Monte Carlo (MC) simulation; phase noise; process variability;
fLanguage :
English
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
1530-4388
Type :
jour
DOI :
10.1109/TDMR.2012.2195181
Filename :
6186811
Link To Document :
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