Fabrication of Discrete Track Media by Cr Ion Implantation

Author

Hinoue, Tatsuya ; Ono, Toshinori ; Inaba, Hiroshi ; Iwane, Tomohiro ; Yakushiji, Hiroshi ; Chayahara, Akiyoshi

Author_Institution

Central Res. Lab., Hitachi Ltd., Odawara, Japan

Volume

46

Issue

6

fYear

2010

fDate

6/1/2010 12:00:00 AM

Firstpage

1584

Lastpage

1586

Abstract

Discrete track media were successfully fabricated by Cr ion implantation. The saturation magnetization of the CoCrPt-SiO₂ perpendicular recording layer was decreased down to 6% by implanting Cr ions with a dosage of 1 Ã— 10¹⁷ ions/cm and an ion energy of 20 keV. A resist mask with a discrete track pattern was prepared by e-beam lithography and the pattern was transferred to the recording layer by Cr ion implantation. A clear magnetic contrast of the tracks was observed and the average surface roughness was maintained less than 1 nm. A clear servo signal was obtained by spin-stand measurement using a flying head. Feasibility of discrete track media fabrication by Cr ion implantation was confirmed.

Keywords

chromium; chromium alloys; cobalt alloys; electron beam lithography; ion implantation; magnetisation; perpendicular magnetic recording; platinum compounds; silicon compounds; surface roughness; CoCrPt-SiO₂; Cr; discrete track media; discrete track pattern; e-beam lithography; electron volt energy 20 keV; flying head; ion energy; ion implantation; magnetic contrast; perpendicular recording layer; resist mask; saturation magnetization; spin-stand measurement; surface roughness; Chromium; Disk recording; Fabrication; Ion implantation; Lithography; Magnetic recording; Perpendicular magnetic recording; Resists; Rough surfaces; Saturation magnetization; Discrete track media; ion implantation; perpendicular recording; plane surface;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/TMAG.2010.2043416

Filename

5467573