Title :
Passive polarization converter in SiON technology
Author :
Koster, Ton ; Lambeck, Paul V.
Author_Institution :
MESA Res. Inst., Twente Univ., Enschede, Netherlands
fDate :
6/1/2001 12:00:00 AM
Abstract :
A passive polarization converter has been realized in silicon oxynitride (SiON) technology. The device is a grating assisted codirectional coupler consisting of segments of asymmetrically etched ridge waveguides. By using a double-masking technique, the fabrication of the device is tolerant with respect to the alignment of the required masks. Conversion efficiencies up to 0.98 (TE→TM and TM→TE) and insertion losses of 3 dB/cm have been measured. Using 2-D beam propagation method simulations, an observed beat pattern in the converter could be explained as due to a leaky mode, which is captured in the grating structure
Keywords :
integrated optics; masks; optical couplers; optical losses; optical polarisers; optical waveguides; ridge waveguides; silicon compounds; silicon-on-insulator; 2-D beam propagation method simulations; SiON; SiON technology; asymmetrically etched ridge waveguides; double-masking technique; grating assisted codirectional coupler; grating structure; insertion losses; leaky mode; passive polarization converter; silicon oxynitride; Fabrication; Gratings; Integrated optics; Optical devices; Optical fiber polarization; Optical polarization; Optical propagation; Optical sensors; Optical waveguides; Silicon;
Journal_Title :
Lightwave Technology, Journal of
