DocumentCode :
1500185
Title :
Transport and structural properties of Bi-Sr-Ca-Cu-oxide thin films prepared by reactive magnetron sputtering
Author :
Face, D.W. ; Kucera, J.T. ; Crain, J. ; Matthiesen, M.M. ; Steel, D. ; Somer, G. ; Lewis, J. ; Graybeal, J.M. ; Orlando, T.P. ; Rudman, D.A.
Author_Institution :
Center for Mater. Sci. & Eng., MIT, Cambridge, MA, USA
Volume :
25
Issue :
2
fYear :
1989
fDate :
3/1/1989 12:00:00 AM
Firstpage :
2341
Lastpage :
2344
Abstract :
Highly oriented superconducting thin films of Bi-Sr-Ca-Cu-oxides have been reproducibly prepared by reactive magnetically-enhanced triode sputtering using three separate metal targets (Sr, Ca, and Cu-Bi). The as-deposited films had composition ratios of Bi:Sr:Ca:Cu that were very close to either 2:2:1:2 or 2:2:2:3. The films were deposited on SrTiO 3, MgO, CaF2, Al2O3, and yttria stabilized zirconia (YSZ) substrates and had thicknesses of about 250 nm. After deposition, the films were annealed to 850-900°C in various partial pressures of oxygen (0.05, 0.2 and 1 atm). Films deposited on [100]SrTiO3 and [100]MgO substrates showed little or not interaction with the substrate after annealing and are the primary focus of this study. Significant substrate interaction and poor film quality were observed for films on CaF2, Al2O 3, and YSZ substrates. Reduced partial pressures of oxygen (0.05 and 0.2 atm.) generally gave the highest quality films for a given annealing cycle. The electrical resistance of the best 2212 films on MgO and SrTiO3 decreased approximately linearly with temperature until the onset of superconductivity at about 85 K
Keywords :
bismuth compounds; calcium compounds; high-temperature superconductors; sputter deposition; strontium compounds; superconducting thin films; 85 K; 850 to 900 degC; Al2O3; Bi-Sr-Ca-Cu-O; Bi-Sr-Ca-Cu-oxide thin films; CaF2; MgO; SrTiO3; Y2O3-ZrO2; annealing; as-deposited films; composition ratios; electrical resistance; high temperature superconductor; highly oriented films; reactive magnetically-enhanced triode sputtering; reactive magnetron sputtering; structural properties; substrate interaction; transport properties; Annealing; Magnetic films; Magnetic separation; Sputtering; Strontium; Substrates; Superconducting films; Superconducting magnets; Superconducting thin films; Transistors;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.92778
Filename :
92778
Link To Document :
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