Title :
A Taper to Reduce the Straight-to-Bend Transition Loss in Compact Silicon Waveguides
Author :
Shen, Hao ; Fan, Li ; Wang, Jian ; Wirth, Justin C. ; Qi, Minghao
Author_Institution :
Birck Nanotechnol. Center, Purdue Univ., West Lafayette, IN, USA
Abstract :
Strong confinement of light in silicon waveguides allows for sharp bends and, as a result, high-density integration. However, the mode transition loss between the straight and bent portions of a silicon waveguide begins to affect the device performance when the bending radius becomes small. In this letter, we show that a transition region with a step taper between the straight and bent portions of the waveguide can effectively reduce this transition loss. This is demonstrated by measuring the intrinsic round-trip losses of micro-racetrack resonators, where ultralow loss can be precisely characterized according to the quality (Q)-factor change. The results show that the taper can suppress the transition loss from 0.016 to 0.0022 dB for a 4.5-μ m bend radius. Consequently, we improve the Q-factor of such a racetrack resonator from 31 000 to 87 000.
Keywords :
Q-factor; microcavities; optical waveguides; silicon; waveguide transitions; compact silicon waveguides; high-density integration; micro-racetrack resonators; mode transition loss; quality factor change; step taper; straight-to-bend transition loss; transition region; Micro-resonator; Si waveguide; transition loss;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2010.2050681