DocumentCode :
1503436
Title :
Comparison of theoretical and experimental 60 GHz silicon IMPATT diode performance
Author :
Banerjee, J.P. ; Luy, J.F. ; SCHÄFFLER, F.
Author_Institution :
Dept. of Electron. Sci., Calcutta Univ., India
Volume :
27
Issue :
12
fYear :
1991
fDate :
6/6/1991 12:00:00 AM
Firstpage :
1049
Lastpage :
1051
Abstract :
Theoretical and experimental investigations have been carried out for V-band (50-75 GHz) silicon double drift flat profile (DD) and double low high low (DLHL) IMPATT diodes. The theoretical designs have been used for the experimental realisation of the diodes for CW operation. The epitaxial layers were grown by silicon molecular beam epitaxy which enabled the realisation of the complex DLHL profile at millimetre-wave frequencies in the silicon material system for the first time. The maximum obtained conversion efficiency is 14.3%. A comparison of theoretical and experimental results for both types of diodes shows general agreement and the superiority of the DLHL structure.
Keywords :
IMPATT diodes; elemental semiconductors; molecular beam epitaxial growth; silicon; 14.3 percent; 50 to 75 GHz; 60 GHz; CW operation; DLHL structure; EHF; IMPATT diode; MBE; MM-wave device; Si; V-band; conversion efficiency; double drift flat profile; double low high low; epitaxial layers; microwave device; millimetre-wave frequencies; molecular beam epitaxy;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19910652
Filename :
76186
Link To Document :
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