DocumentCode :
1504994
Title :
Multiple linear regression analysis of the overlay accuracy model
Author :
Lin, Zone-Ching ; Wu, Wen-Jang
Author_Institution :
Dept. of Mech. Eng., Nat. Taiwan Univ., Taipei, Taiwan
Volume :
12
Issue :
2
fYear :
1999
fDate :
5/1/1999 12:00:00 AM
Firstpage :
229
Lastpage :
237
Abstract :
The multiple linear regression method was used to analyze the overlay accuracy model and study the feasibility of using linear methods to solve parameters of nonlinear overlay equations. The methods of analysis include changing the number of sample points to derive the least sample number required for solving the accurate estimated parameter values. Besides, different high-order lens distortion parameters were ignored, and only the various modes of low-order parameters were regressed to compare their effects on the overlay analysis results. The findings indicate that given a sufficient number of sample points, the usage of multiple linear regression analysis to solve the high-order nonlinear overlay accuracy model containing seventh-order lens distortion parameters is feasible. When the estimated values of low-order overlay distortion parameters are far greater than those of high-order lens distortion parameters, excellent overlay improvement can still be obtained even if the high-order lens distortion parameters are ignored. When the overlay at the four corners of image field obviously exceeds that near the center of image field, it is found, through simulation, that the seventh-order parameters overlay model established in this paper has to be corrected by high-order lens distortion parameters to significantly improve the overlay accuracy
Keywords :
error analysis; integrated circuit manufacture; lithography; reticles; semiconductor process modelling; statistical analysis; IC manufacture; estimated parameter values; high-order lens distortion parameters; low-order parameters; multiple linear regression analysis; nonlinear overlay equations; overlay accuracy model; sample points; seventh-order parameters overlay model; Error analysis; Helium; Integrated circuit manufacture; Lenses; Linear regression; Nonlinear distortion; Nonlinear equations; Optical distortion; Parameter estimation; Semiconductor device modeling;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/66.762881
Filename :
762881
Link To Document :
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