• DocumentCode
    1505412
  • Title

    Special Section on the International Symposium on Semiconductor Manufacturing

  • Author

    Otsuka, Nobuhiro ; Uchino, Toshiyuki

  • Volume
    22
  • Issue
    4
  • fYear
    2009
  • Firstpage
    417
  • Lastpage
    418
  • Abstract
    The ten papers in this special section were originally presented at the International Symposium on Semiconductor Manufacturing, held October 27-29, 2008, in Tokyo, Japan.
  • Keywords
    Copper; Etching; Lithography; Metrology; Plasma applications; Process control; Rapid thermal annealing; Semiconductor device manufacture; Semiconductor process modeling; Special issues and sections;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/TSM.2009.2031745
  • Filename
    5291683
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1505412