• DocumentCode
    1505625
  • Title

    A self-consistent fluid simulation of an inductively coupled plasma reactor

  • Author

    Bose, Deepak ; Govindan, T.R. ; Meyyappan, M.

  • Volume
    27
  • Issue
    1
  • fYear
    1999
  • fDate
    2/1/1999 12:00:00 AM
  • Firstpage
    54
  • Lastpage
    55
  • Abstract
    We have developed a self-consistent fluid model that couples plasma dynamics, Navier-Stokes equations, and Maxwell´s equations to analyze inductively coupled plasma reactors used in semiconductor processing. Two dimensional simulations of an N2 plasma have been performed and found to agree well with experimental data. Images of plasma density, gas and ion traces are provided
  • Keywords
    Navier-Stokes equations; plasma density; plasma devices; plasma materials processing; plasma simulation; semiconductor technology; Maxwell´s equations; N2 plasma; Navier-Stokes equations; gas traces; inductively coupled plasma reactor; ion traces; plasma density; plasma dynamics; self-consistent fluid simulation; semiconductor processing; two dimensional simulations; Electrons; Inductors; Maxwell equations; Plasma applications; Plasma chemistry; Plasma density; Plasma materials processing; Plasma simulation; Semiconductor device modeling; Semiconductor process modeling;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.763031
  • Filename
    763031
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1505625