Visualization of plasma source ion implantation for arrays of multiple targets

Author

Keiter, E.R. ; Booske, J.H. ; Hitchon, W.N.G.

Author_Institution

Parallel Comput. Sci., Sandia Nat. Labs., Albuquerque, NM, USA

Volume

27

Issue

1

fYear

1999

Firstpage

86

Lastpage

87

Abstract

Visualization of sheath overlap dynamics during plasma source ion implantation (PSII) of a multiple-target array is used to illustrate the effect of target spacing on dose uniformity over the surface of a single target. The simulations are conducted using a hybrid plasma model, and the images are created using the Tecplot package by Amtec. The simulations suggest scaling rules for sheath overlap time as a function of target spacing.

Keywords

arrays; ion density; ion implantation; plasma density; plasma materials processing; plasma sheaths; plasma simulation; plasma-wall interactions; Amtec; Tecplot package; arrays; dose uniformity; hybrid plasma mode; images; multiple target arrays; multiple targets; plasma source ion implantation; scaling rules; sheath overlap dynamics; sheath overlap time; simulations; single target; target spacing; visualization; Electrons; Electrostatics; Ion implantation; Plasma applications; Plasma immersion ion implantation; Plasma sheaths; Plasma simulation; Plasma sources; Plasma temperature; Visualization;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.763054

Filename

763054