Title :
Two-dimensional optical emission imaging of a pulsed supersonic plasma jet
Author :
Postel, Olivier P. ; Heberlein, Joachim V R
Author_Institution :
Dept. of Mech. Eng., Minnesota Univ., Minneapolis, MN, USA
fDate :
2/1/1999 12:00:00 AM
Abstract :
Two-dimensional monochromatic and time resolved imaging of a pulsed supersonic plasma jet is used to qualitatively determine the influence of a secondary discharge on the plasma jet chemistry in a chemical vapor deposition (CVD) reactor. In this reactor, thin films of boron carbide are grown from the thermal dissociation of boron trichloride and methane. We have found in a previous study that a positive bias applied to the substrate increased significantly the growth rate. In this study, we make use of emission spectroscopy imaging to map the possible growth precursors under different bias conditions
Keywords :
plasma CVD; plasma diagnostics; plasma flow; plasma jets; supersonic flow; 249.7 nm; 696.5 nm; BC; BC thin films; BCl3; BCl3 thermal dissociation; CVD reactor; bias conditions; chemical vapor deposition reactor; emission spectroscopy imaging; growth precursors; methane; monochromatic imaging; plasma jet chemistry; positive bias; pulsed supersonic plasma jet; secondary discharge; substrate; time resolved imaging; two-dimensional optical emission imaging; Boron; Chemical vapor deposition; Image resolution; Inductors; Optical films; Optical imaging; Optical pulses; Plasma chemistry; Pulsed laser deposition; Stimulated emission;
Journal_Title :
Plasma Science, IEEE Transactions on
