Two-dimensional optical emission imaging of a pulsed supersonic plasma jet

Author

Postel, Olivier P. ; Heberlein, Joachim V R

Author_Institution

Dept. of Mech. Eng., Minnesota Univ., Minneapolis, MN, USA

Volume

27

Issue

1

fYear

1999

fDate

2/1/1999 12:00:00 AM

Firstpage

100

Lastpage

101

Abstract

Two-dimensional monochromatic and time resolved imaging of a pulsed supersonic plasma jet is used to qualitatively determine the influence of a secondary discharge on the plasma jet chemistry in a chemical vapor deposition (CVD) reactor. In this reactor, thin films of boron carbide are grown from the thermal dissociation of boron trichloride and methane. We have found in a previous study that a positive bias applied to the substrate increased significantly the growth rate. In this study, we make use of emission spectroscopy imaging to map the possible growth precursors under different bias conditions

Keywords

plasma CVD; plasma diagnostics; plasma flow; plasma jets; supersonic flow; 249.7 nm; 696.5 nm; BC; BC thin films; BCl₃; BCl₃ thermal dissociation; CVD reactor; bias conditions; chemical vapor deposition reactor; emission spectroscopy imaging; growth precursors; methane; monochromatic imaging; plasma jet chemistry; positive bias; pulsed supersonic plasma jet; secondary discharge; substrate; time resolved imaging; two-dimensional optical emission imaging; Boron; Chemical vapor deposition; Image resolution; Inductors; Optical films; Optical imaging; Optical pulses; Plasma chemistry; Pulsed laser deposition; Stimulated emission;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.763064

Filename

763064