DocumentCode
1505771
Title
Pattern-dependent charging in plasmas
Author
Hwang, Gyeong S. ; Giapis, Konstantinos P.
Author_Institution
Div. of Chem. & Chem. Eng., California Inst. of Technol., Pasadena, CA, USA
Volume
27
Issue
1
fYear
1999
fDate
2/1/1999 12:00:00 AM
Firstpage
102
Lastpage
103
Abstract
When patterned surfaces are exposed to plasmas, the directionality difference between ions and electrons causes differential charging of the pattern. Potential contour maps, generated by Monte Carlo simulations of charging in mixed conductor-insulator structures, illustrate where charging occurs and how it becomes more aggravated as the number of features in the pattern increases (a feature multiplicity effect)
Keywords
Monte Carlo methods; electrostatics; plasma simulation; plasma theory; plasma-wall interactions; Monte Carlo simulations; damage; differential charging; directionality; electron shading; electrons; feature multiplicity effect; ions; mixed conductor-insulator structures; pattern-dependent charging; patterned surfaces; plasmas; potential contour maps; steady-state; Electrons; Helium; Plasma accelerators; Plasma confinement; Plasma materials processing; Plasma sheaths; Plasma simulation; Plasma temperature; Surface charging; Tunneling;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.763065
Filename
763065
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