DocumentCode :
1506675
Title :
A new low-temperature bonding technology between large-area, high-power devices and Mo electrodes using Au-Al films
Author :
Onuki, Jin ; Satou, Mitsuo ; Murakami, Susumu ; Yatsuo, Tsutomu
Author_Institution :
Res. Lab., Hitachi Ltd., Ibaraki, Japan
Volume :
44
Issue :
12
fYear :
1997
fDate :
12/1/1997 12:00:00 AM
Firstpage :
2154
Lastpage :
2159
Abstract :
In order to realize large-area, high-power devices with high-performance, low-temperature diffusion, bonding technology between Al electrodes on both cathode and anode sides of Si devices and Mo electrode foils has been investigated, The 100 mm diameter power devices and the same size Mo foils could be joined by the formation of Au-Al intermetallic compounds below 573 K. The compounds were formed by solid state diffusion with activation energy of about 1.0 eV. Substantial reduction of the mounting force while keeping uniform contact was possible after low-temperature bonding. Reliability of the bonded large area, high-power device was predicted to be sufficient from a metallurgical viewpoint
Keywords :
aluminium; contact resistance; diffusion; joining processes; molybdenum; power semiconductor devices; semiconductor device metallisation; semiconductor device reliability; 1.0 eV; 100 mm; Mo-AuAl-Al; activation energy; high-power devices; large-area devices; low-temperature diffusion bonding technology; mounting force; reliability; solid state diffusion; uniform contact; Anodes; Bonding forces; Cathodes; Contact resistance; Diffusion bonding; Electrical resistance measurement; Electrodes; Laboratories; Temperature; Thermal resistance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.644629
Filename :
644629
Link To Document :
بازگشت