• DocumentCode
    1506675
  • Title

    A new low-temperature bonding technology between large-area, high-power devices and Mo electrodes using Au-Al films

  • Author

    Onuki, Jin ; Satou, Mitsuo ; Murakami, Susumu ; Yatsuo, Tsutomu

  • Author_Institution
    Res. Lab., Hitachi Ltd., Ibaraki, Japan
  • Volume
    44
  • Issue
    12
  • fYear
    1997
  • fDate
    12/1/1997 12:00:00 AM
  • Firstpage
    2154
  • Lastpage
    2159
  • Abstract
    In order to realize large-area, high-power devices with high-performance, low-temperature diffusion, bonding technology between Al electrodes on both cathode and anode sides of Si devices and Mo electrode foils has been investigated, The 100 mm diameter power devices and the same size Mo foils could be joined by the formation of Au-Al intermetallic compounds below 573 K. The compounds were formed by solid state diffusion with activation energy of about 1.0 eV. Substantial reduction of the mounting force while keeping uniform contact was possible after low-temperature bonding. Reliability of the bonded large area, high-power device was predicted to be sufficient from a metallurgical viewpoint
  • Keywords
    aluminium; contact resistance; diffusion; joining processes; molybdenum; power semiconductor devices; semiconductor device metallisation; semiconductor device reliability; 1.0 eV; 100 mm; Mo-AuAl-Al; activation energy; high-power devices; large-area devices; low-temperature diffusion bonding technology; mounting force; reliability; solid state diffusion; uniform contact; Anodes; Bonding forces; Cathodes; Contact resistance; Diffusion bonding; Electrical resistance measurement; Electrodes; Laboratories; Temperature; Thermal resistance;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.644629
  • Filename
    644629