DocumentCode :
150680
Title :
An X to Ka-Band fully-integrated stacked power amplifier in 45 nm CMOS SOI technology
Author :
Helmi, S.R. ; Jing-Hwa Chen ; Mohammadi, Soheil
Author_Institution :
Purdue Univ., West Lafayette, IN, USA
fYear :
2014
fDate :
19-23 Jan. 2014
Firstpage :
74
Lastpage :
76
Abstract :
An X to Ka-Band fully-integrated power amplifier (PA) designed with 8 stacked transistors is implemented in a 45 nm CMOS SOI technology. The stacked configuration allows the PA to deliver high output power over a wide bandwidth while each transistor is biased under low drain-source voltage. At 18 GHz, the PA under a bias supply of 9.6 V measures a saturated output power PSAT and linear output power P1dB of 27 dBm (0.5 Watt) and 24.5 dBm, respectively, with a peak power-added efficiency PAE of 11.8%. For the frequencies measured from 10 to 32 GHz, the PSAT, and P1dB are above 23.9 dBm and 18.8 dBm, respectively.
Keywords :
CMOS integrated circuits; MMIC power amplifiers; field effect MMIC; silicon-on-insulator; CMOS SOI technology; Ka-band fully-integrated stacked power amplifier; PA; X-band fully-integrated stacked power amplifier; frequency 10 GHz to 32 GHz; low drain-source voltage; power 0.5 W; size 45 nm; stacked transistors; voltage 9.6 V; Broadband amplifiers; CMOS integrated circuits; CMOS technology; Power amplifiers; Power generation; Transistors; CMOS; SOI; broadband; stacked power amplifiers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Silicon Monolithic Integrated Circuits in Rf Systems (SiRF), 2014 IEEE 14th Topical Meeting on
Conference_Location :
Newport Beach, CA
Type :
conf
DOI :
10.1109/SiRF.2014.6828520
Filename :
6828520
Link To Document :
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