A new method for extracting the channel-length reduction and the gate-voltage-dependent series resistance of counter-implanted p-MOSFETs

Based on the channel-resistance measurement, a new method for extracting the channel-length reduction (ΔL_jj) and the gate-voltage-dependent source/drain resistance (R_SD) of counter-implanted p-MOSFETs is proposed, in which the necessity of the applying substrate bias is demonstrated and an empirical relationship between poly-Si gate length (L_M) and device structure parameters for ΔL_jj extraction is provided. This is the first attempt to extract the basic parameters of counter-implanted p-MOSFETs with the LDD structure. Numerical analysis using two-dimensional (2-D) device simulator has been used to verify the proposed extraction method. Furthermore, an improved approach to extract R_SD is also presented. Both numerical analysis and experimental results show good accuracy of our proposed method