• DocumentCode
    150766
  • Title

    A 0.28-0.8V 320 fW D-latch for sub-VT memories in 65 nm CMOS

  • Author

    Mohammadi, Bahareh ; Andersson, Oskar ; Meinerzhagen, Pascal ; Sherazi, Yasser ; Burg, Andreas ; Rodrigues, Joachim Neves

  • Author_Institution
    Dept. of Electr. & Inf. Technol., Lund Univ., Lund, Sweden
  • fYear
    2014
  • fDate
    4-6 May 2014
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    The design of an ultra-low-leakage latch, suitable for subthreshold standard-cell based memories in 65nm CMOS is presented. Various latch architectures are compared in terms of leakage, area and speed. The most leakage-efficient architecture is optimized by transistor stacking and channel length stretching. The final design is supplemented with a 3-state output buffer to provide low-leakage read functionality in memory applications. Silicon measurements confirm simulation results including the reliability analysis based on Monte-Carlo simulations. The latch is fully functional at 280mV and retains data down to a supply voltage of 220mV, consuming as little as 230fW leakage power.
  • Keywords
    CMOS memory circuits; buffer storage; flip-flops; integrated circuit reliability; low-power electronics; 3-state output buffer; CMOS process; D-latch; Monte-Carlo simulations; channel length stretching; leakage power; leakage-efficient architecture; low-leakage read functionality; power 320 fW; reliability analysis; silicon measurements; size 65 nm; sub-VT memories; subthreshold standard-cell based memories; transistor stacking; ultra-low-leakage latch; voltage 0.28 V to 0.8 V; CMOS integrated circuits; Latches; Leakage currents; Random access memory; Silicon; Stacking; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Faible Tension Faible Consommation (FTFC), 2014 IEEE
  • Conference_Location
    Monaco
  • Type

    conf

  • DOI
    10.1109/FTFC.2014.6828618
  • Filename
    6828618