DocumentCode
150766
Title
A 0.28-0.8V 320 fW D-latch for sub-VT memories in 65 nm CMOS
Author
Mohammadi, Bahareh ; Andersson, Oskar ; Meinerzhagen, Pascal ; Sherazi, Yasser ; Burg, Andreas ; Rodrigues, Joachim Neves
Author_Institution
Dept. of Electr. & Inf. Technol., Lund Univ., Lund, Sweden
fYear
2014
fDate
4-6 May 2014
Firstpage
1
Lastpage
4
Abstract
The design of an ultra-low-leakage latch, suitable for subthreshold standard-cell based memories in 65nm CMOS is presented. Various latch architectures are compared in terms of leakage, area and speed. The most leakage-efficient architecture is optimized by transistor stacking and channel length stretching. The final design is supplemented with a 3-state output buffer to provide low-leakage read functionality in memory applications. Silicon measurements confirm simulation results including the reliability analysis based on Monte-Carlo simulations. The latch is fully functional at 280mV and retains data down to a supply voltage of 220mV, consuming as little as 230fW leakage power.
Keywords
CMOS memory circuits; buffer storage; flip-flops; integrated circuit reliability; low-power electronics; 3-state output buffer; CMOS process; D-latch; Monte-Carlo simulations; channel length stretching; leakage power; leakage-efficient architecture; low-leakage read functionality; power 320 fW; reliability analysis; silicon measurements; size 65 nm; sub-VT memories; subthreshold standard-cell based memories; transistor stacking; ultra-low-leakage latch; voltage 0.28 V to 0.8 V; CMOS integrated circuits; Latches; Leakage currents; Random access memory; Silicon; Stacking; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Faible Tension Faible Consommation (FTFC), 2014 IEEE
Conference_Location
Monaco
Type
conf
DOI
10.1109/FTFC.2014.6828618
Filename
6828618
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