DocumentCode
1507961
Title
A New Approach to High-Power Pulsed Glow Plasma Generation: Shunting Glow Plasma
Author
Takaki, Koichi ; Ogiso, Hisato ; Nakano, Shizuka ; Yukimura, Ken
Author_Institution
Dept. of Electr. & Electron. Eng., Iwate Univ., Morioka, Japan
Volume
40
Issue
7
fYear
2012
fDate
7/1/2012 12:00:00 AM
Firstpage
1801
Lastpage
1808
Abstract
Shunting discharge plasmas are metal plasmas that can be generated around a conductive rod at a reduced pressure on the order of 0.1-100 Pa. Even at atmospheric pressure, a plasma can be generated because the rod is heated to emit metal vapor so as to generate gas breakdown around the rod. When the temporally increasing voltage across the rod matches the plasma ignition voltage, a shunting plasma is ignited. The plasma ignition is triggerless and, thus, does not require an external signal. There are two types of shunting plasmas: glow and arc discharges, with sustenance voltages of approximately 100 and 60 V, respectively. The plasma results in an arc discharge via a glow state. When a pulsed-power source with a controlled pulse duration is used to obtain a glow plasma only, a stable steady-state glow can be obtained under a suppressed current with a duration of over 10 s and a consumed power of several tens of kilowatts. A shunting glow plasma can be realized by controlling the pulse duration. In this paper, optical emission spectra from the shunting glow and shunting arc are observed. Singly charged carbon ions were found to be produced by the glow plasma. Carbon emission was significant in a nitrogen gas environment, as compared with an argon environment. In the case of a shunting arc, the optical emission is broad in wavelength, and doubly ionized carbon species also arise. A preliminary test of diamond-like carbon (DLC) film deposition was carried out, where the DLC was deposited on a substrate set near a plasma source. The DLC state was determined using Raman spectroscopy, and no macroparticles were found on the deposited film, which had a clean surface. The rod holder used as an electrode showed no damage. In contrast, in the case of a shunting arc, many macroparticles were found on the deposited films, and serious damage to the electrode also occurred.
Keywords
arcs (electric); carbon; glow discharges; plasma deposition; plasma sources; thin films; C; DLC film deposition; Raman spectroscopy; arc discharges; argon environment; carbon emission; conductive rod; diamond like carbon film deposition; gas breakdown; glow discharges; high power pulsed glow plasma generation; metal plasmas; metal vapor; nitrogen gas environment; plasma ignition voltage; pulse duration control; pulsed power source; shunting arc optical emission spectra; shunting discharge plasmas; shunting glow optical emission spectra; shunting glow plasma; singly charged carbon ions; stable steady state glow; Capacitors; Carbon dioxide; Nitrogen; Optical pulses; Plasmas; Stimulated emission; Arc discharge; HPPS; glow discharge; high-power impulse magnetron sputtering (HIPIMS); high-power pulsed magnetron sputtering; shunting arc; shunting plasma;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2012.2191624
Filename
6194343
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