Title :
GMR in corrugated Co/Cu multilayers
Author :
Maeda, Atsushi ; Tanuma, Toshio ; Kume, Minoru ; Shimizu, Ryu ; Doi, Atsumasa
Author_Institution :
New Mater. Res. Center, Sanyo Electr. Co. Ltd., Osaka, Japan
fDate :
9/1/1997 12:00:00 AM
Abstract :
A new corrugated material comprising antiferromagnetically coupled Co/Cu multilayers was prepared using V-grooved Si substrates. Scanning electron microscopy and X-ray diffraction observations indicate that the corrugated multilayers were successfully grown with the formation of smooth and clear interfaces. Magnetoresistance change with the sense current normal to the grooves was larger than that with the current parallel to the grooves. The MR enhancement due to the difference in measurement geometry increased as the width of the grooves decreased
Keywords :
X-ray diffraction; antiferromagnetic materials; cobalt; copper; giant magnetoresistance; magnetic multilayers; scanning electron microscopy; Co-Cu; X-ray diffraction; antiferromagnetically coupled Co/Cu multilayers; corrugated Co/Cu multilayers; giant magnetoresistance; measurement geometry; scanning electron microscopy; Antiferromagnetic materials; Geometry; Giant magnetoresistance; Magnetic anisotropy; Magnetic materials; Magnetic multilayers; Nonhomogeneous media; Perpendicular magnetic anisotropy; Scanning electron microscopy; Substrates;
Journal_Title :
Magnetics, IEEE Transactions on
