Title :
Optical and physical characterization of SiO2-x-Al thin-film polarizer on x-cut LiNbO3 substrate
Author :
Miyama, Yasuyuki ; Nagata, Hirotoshi
Author_Institution :
Optoelectron. Res. Div., Sumitomo Osaka Cement Co. Ltd., Chiba, Japan
fDate :
7/1/2001 12:00:00 AM
Abstract :
For the purpose of a mechanical evaluation of a metal-cladding polarizer, a precise characterization of SiO2-x-Al thin-film succession fabricated on a LiNbO3 substrate was made as well as an experimental optimization of the SiO2-x-Al polarizer for the Ti:LiNbO3 waveguide. A 10-nm-thick SiO2-x was selected as the optimized underlay of a SiO2-x-Al polarizer for the Ti:LiNbO3 waveguide using a wavelength of λ=1.55 μm. Results of scratch testing show that the adhesive strength of SiO2-x-Al films was almost the same level as that of Ti-Au films on a thick SiO2 layer, commonly used for metallic underlay of Au-plated electrodes. From observing SiO2-x -Al film using a transmission electron microscope, it was confirmed that the 10-nm-thick SiO2-x underlay stratified well without serious thickness fluctuation
Keywords :
adhesion; aluminium; mechanical variables measurement; optical films; optical polarisers; optical waveguides; silicon compounds; transmission electron microscopy; 1.55 mum; 10 nm; LiNbO3; LiNbO3 substrate; LiNbO3:Ti; SiO2-x-Al polarizer; SiO2-x-Al thin-film; SiO2-x-Al thin-film polarizer; SiO2-Al; TEM; Ti:LiNbO3 waveguide; adhesive strength; experimental optimization; mechanical evaluation; metal-cladding polarizer; optimized underlay; physical characterization; precise characterization; scratch testing; stratified underlay; transmission electron microscope; x-cut LiNbO3 substrate; Adhesive strength; Electrodes; Fluctuations; Optical films; Optical polarization; Optical waveguides; Substrates; Testing; Transistors; Transmission electron microscopy;
Journal_Title :
Lightwave Technology, Journal of
