Title :
The magnetic properties and microstructure of strontium ferrite films with perpendicular and in-plane magnetic anisotropy
Author :
Acharya, B. Ramamurthy ; Prasad, S. ; Venkataramani, N. ; Ebarra, E.N. ; Suzuki, T.
Author_Institution :
Inf. Storage Mater. Lab., Toyota Technol. Inst., Nagoya, Japan
fDate :
9/1/1997 12:00:00 AM
Abstract :
The texture and the easy axis of magnetization of strontium ferrite (SrFe12O19) thin films can be controlled by changing the power of the rf sputtering. In-plane magnetic anisotropy is developed at a sputtering power of 330 W (7.5 W/cm2), whereas strong perpendicular magnetic anisotropy (Ku~1×106 erg/cc) is induced at 60 W power (1.3 W/cm2). Further control over coercivity and morphology can be achieved by changing the ratio R, between oxygen and argon in the sputtering gas. Coercivity decreases with R. Films deposited without oxygen exhibit higher coercivity and less intergranular interaction as compared to films sputtered with oxygen
Keywords :
coercive force; crystal microstructure; crystal morphology; ferrites; magnetic anisotropy; magnetic thin films; perpendicular magnetic anisotropy; sputter deposition; strontium compounds; texture; 60 to 330 W; SrFe12O19; coercivity; easy axis; in-plane magnetic anisotropy; intergranular interaction; magnetic properties; magnetization; microstructure; morphology; perpendicular magnetic anisotropy; rf sputtering; sputtering power; strong perpendicular magnetic anisotropy; strontium ferrite films; texture; thin films; Coercive force; Ferrites; Magnetic anisotropy; Magnetic properties; Magnetization; Microstructure; Morphology; Perpendicular magnetic anisotropy; Sputtering; Strontium;
Journal_Title :
Magnetics, IEEE Transactions on
