DocumentCode
1509296
Title
Effect of sputtering pressure of Pd underlayer on the perpendicular magnetic anisotropy in Co/Pd multilayered thin films
Author
Oh, Hoon-Sang ; Lee, Byung-II ; Joo, Seung-Ki
Author_Institution
Coll. of Eng., Seoul Nat. Univ., South Korea
Volume
33
Issue
5
fYear
1997
fDate
9/1/1997 12:00:00 AM
Firstpage
3655
Lastpage
3657
Abstract
The magnetic properties of Co/Pd multilayers, in particular the perpendicular magnetic anisotropy, have been analyzed as a function of the sputtering pressure of Pd underlayer. With an increase of sputtering pressure of the underlayer from 6 mTorr to 25 mTorr, perpendicular coercivity of the multilayers increased with a slight decrease of saturation magnetization, and the increment of the coercivity was larger for the films with thinner cobalt layers. From the anisotropy analysis, it was found that the interface anisotropy energy decreased from 0.390 erg/cm2 to 0.255 erg/cm2 because of the interface roughening of the multilayers, which was mainly responsible for the decrease of perpendicular anisotropy, while the volume anisotropy energy increased from -11.37×106 erg/cm3 to -7.90×106 erg/cm3. The abnormally large intrinsic volume anisotropy energies of the multilayers with thin cobalt layers (<7 Å) appears to suggest the noticeable contribution of magnetoelastic effect to the perpendicular anisotropy of the films
Keywords
cobalt; coercive force; interface structure; magnetic multilayers; magnetisation; magnetoelastic effects; palladium; perpendicular magnetic anisotropy; sputter deposition; 6 to 25 mtorr; Co-Pd; Co/Pd multilayered thin films; Pd underlayer; interface anisotropy energy; interface roughening; magnetic properties; magnetoelastic effect; perpendicular coercivity; perpendicular magnetic anisotropy; saturation magnetization; sputtering pressure; volume anisotropy energy; Anisotropic magnetoresistance; Cobalt; Coercive force; Magnetic analysis; Magnetic multilayers; Magnetic properties; Nonhomogeneous media; Perpendicular magnetic anisotropy; Saturation magnetization; Sputtering;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.619528
Filename
619528
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