Fabrication of buried channel waveguides in fused silica using focused MeV proton beam irradiation

Author

Roberts, A. ; von Bibra, M.L.

Author_Institution

Sch. of Phys., Melbourne Univ., Parkville, Vic., Australia

Volume

14

Issue

11

fYear

1996

fDate

11/1/1996 12:00:00 AM

Firstpage

2554

Lastpage

2557

Abstract

Low-loss channel waveguides have been fabricated in fused silica using a beam of MeV protons focused down to a spot size of several microns. By using a combination of beam and sample scanning, single- and multimode graded index waveguides with lateral dimensions down to approximately 5 μm×5 μm have been fabricated using ion doses in the range (3×10¹⁴)-(6×10¹⁶) ions/cm ². Typical beam currents in the range 100 pA-10 nA were used. Optical mode profiles have been measured at 670 nm and propagation losses of the order of 3 dB/cm measured in unannealed samples. Annealing the substrate for 1 h at 500°C reduced these losses to below 0.5 dB/cm

Keywords

annealing; focused ion beam technology; gradient index optics; optical fabrication; optical losses; optical waveguides; proton effects; silicon compounds; 0.95 MeV; 1 hour; 1.9 MeV; 100 pA to 10 nA; 5 mum; 500 C; 670 nm; SiO₂; beam currents; beam scanning; buried channel waveguide fabrication; focused MeV proton beam irradiation; fused SiO₂; ion doses; lateral dimensions; multimode graded index waveguides; optical mode profiles; propagation losses; sample scanning; single-mode graded index waveguides; spot size; substrate annealing; Annealing; Loss measurement; Optical device fabrication; Optical losses; Optical waveguides; Particle beam optics; Particle beams; Propagation losses; Protons; Silicon compounds;

fLanguage

English

Journal_Title

Lightwave Technology, Journal of

Publisher

ieee

ISSN

0733-8724

Type

jour

DOI

10.1109/50.548154

Filename

548154