• DocumentCode
    1510062
  • Title

    Sealing current and regeneration of copper junctions

  • Author

    Schubert, Rudolf

  • Author_Institution
    Bellcore, Red Bank, NJ, USA
  • Volume
    14
  • Issue
    1
  • fYear
    1991
  • fDate
    3/1/1991 12:00:00 AM
  • Firstpage
    214
  • Lastpage
    217
  • Abstract
    In selected situations, the operating telephone companies apply a sealing (wetting) current of ≈20 mA to lines containing copper junctions to prevent the contact resistance of the junctions from increasing and/or fluctuating, or to reduce the resistance of an already degraded junction. The effect of a variety of sealing current treatments on the contact resistance of a set of junctions that were aged in an accelerated atmospheric corrosion chamber is examined. A junction configuration in which the wires are only light twisted together was used. Measurements made during and after exposure show that application of 20-mA sealing current approximately limits the contact resistance to less than 21 Ω. Smaller currents allow correspondingly higher contact resistances and fluctuations. Sealing current is shown to be ineffective in preventing the degradation of a junction predisposed to degrade and in regenerating an already degraded junction
  • Keywords
    contact resistance; copper; electrical contacts; 20 mA; 21 ohm; Cu-Cu junctions regeneration; accelerated atmospheric corrosion chamber; contact resistance; junction configuration; light twisted together; sealing current; Accelerated aging; Atmospheric measurements; Contact resistance; Copper; Corrosion; Current measurement; Degradation; Electrical resistance measurement; Telephony; Wires;
  • fLanguage
    English
  • Journal_Title
    Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0148-6411
  • Type

    jour

  • DOI
    10.1109/33.76535
  • Filename
    76535