DocumentCode :
1510062
Title :
Sealing current and regeneration of copper junctions
Author :
Schubert, Rudolf
Author_Institution :
Bellcore, Red Bank, NJ, USA
Volume :
14
Issue :
1
fYear :
1991
fDate :
3/1/1991 12:00:00 AM
Firstpage :
214
Lastpage :
217
Abstract :
In selected situations, the operating telephone companies apply a sealing (wetting) current of ≈20 mA to lines containing copper junctions to prevent the contact resistance of the junctions from increasing and/or fluctuating, or to reduce the resistance of an already degraded junction. The effect of a variety of sealing current treatments on the contact resistance of a set of junctions that were aged in an accelerated atmospheric corrosion chamber is examined. A junction configuration in which the wires are only light twisted together was used. Measurements made during and after exposure show that application of 20-mA sealing current approximately limits the contact resistance to less than 21 Ω. Smaller currents allow correspondingly higher contact resistances and fluctuations. Sealing current is shown to be ineffective in preventing the degradation of a junction predisposed to degrade and in regenerating an already degraded junction
Keywords :
contact resistance; copper; electrical contacts; 20 mA; 21 ohm; Cu-Cu junctions regeneration; accelerated atmospheric corrosion chamber; contact resistance; junction configuration; light twisted together; sealing current; Accelerated aging; Atmospheric measurements; Contact resistance; Copper; Corrosion; Current measurement; Degradation; Electrical resistance measurement; Telephony; Wires;
fLanguage :
English
Journal_Title :
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
Publisher :
ieee
ISSN :
0148-6411
Type :
jour
DOI :
10.1109/33.76535
Filename :
76535
Link To Document :
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