DocumentCode :
1510499
Title :
Amorphous Si/SiC phototransistors and avalanche photodiodes
Author :
Chang, C.Y. ; Hong, J.-W. ; Fang, Y.K.
Author_Institution :
Inst. of Electron., Nat. Chiao Tung Univ., Hsinchu, Taiwan
Volume :
138
Issue :
3
fYear :
1991
fDate :
6/1/1991 12:00:00 AM
Firstpage :
226
Lastpage :
234
Abstract :
The device structures, operation principles, optoelectronic characteristics, performance comparisons, and possible applications for various a-Si:H/a-SiC:H phototransistors and avalanche photodiodes are reviewed. Although these devices are made of amorphous semiconductors, its majority-carrier transport properties can tactfully avoid gap-state and defect related minority-carrier transport problems, and obtained good performances. Also, each of these devices has the distinct advantage of meeting the requirements of different practical applications. The unique and distinct advantages of these a-Si:H/a-SiC:H devices are first, a variety of peak response wavelengths are achievable by changing the composition or the well-to-barrier widths of the superlattice, secondly, a large-area-detector image sensor can be made on a glass substrate; and thirdly, the low-temperature of the amorphous films (~250°C) possesses a very abrupt composition change and a doping profile, which are impossible in the single-crystalline semiconductors
Keywords :
amorphous semiconductors; avalanche photodiodes; carrier mobility; elemental semiconductors; hydrogen; phototransistors; silicon; silicon compounds; 250 degC; Si:H-SiC:H; amorphous films; amorphous semiconductors; avalanche photodiodes; composition change; device structures; doping profile; glass substrate; large-area-detector image sensor; majority-carrier transport; optoelectronic characteristics; peak response wavelengths; phototransistors; superlattice; well-to-barrier widths;
fLanguage :
English
Journal_Title :
Optoelectronics, IEE Proceedings J
Publisher :
iet
ISSN :
0267-3932
Type :
jour
Filename :
76589
Link To Document :
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