DocumentCode :
1510703
Title :
Improved Capacitance Density and Reliability of High-  \\kappa \\hbox {Ni}/\\hbox {ZrO}_{2}/\\hbox {TiN}</div>
        </div>
        <div class='row'>
            <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Author : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>Tsai, C.Y. ; Chiang, K.C. ; Lin, S.H. ; Hsu, K.C. ; Chi, C.C. ; Chin, Albert</div>
        </div>
        <div class='row'>
            <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Author_Institution : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>Electron. Eng. Dept., Nat. Chiao Tung Univ., Hsinchu, Taiwan</div>
        </div>
        <div class='row'>
            <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Volume : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>31</div>
        </div>
        <div class='row'>
            <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Issue : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>7</div>
        </div>
        <div class='row'>
            <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>fYear : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>2010</div>
        </div>
        <div class='row'>
            <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>fDate : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>7/1/2010 12:00:00 AM</div>
        </div>
        <div class='row'>
            <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Firstpage : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>749</div>
        </div>
        <div class='row'>
            <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Lastpage : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>751</div>
        </div>
        <div class='row'>
            <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Abstract : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>We have fabricated high-κ Ni/ZrO<sub>2</sub>/TiN metal-insulator-metal capacitors with a very high 52-fF/μm<sup>2</sup> capacitance density, a low leakage current of 1.6 × 10<sup>-7</sup>A/cm<sup>2</sup>, and good ten-year reliability with a small ΔC/C of 1.7% at 2 V. From X-ray diffraction measurements, laser annealing can improve the permittivity of ZrO<sub>2</sub> due to tetragonal-phase formation which in turn helps enhance capacitance density and reliability. Such excellent device integrity is attributed to the combination of enhanced ZrO<sub>2</sub> tetragonal phase by laser annealing, high work-function Ni electrode, and good bottom-interface treatment.</div>
        </div>
        <div class='row'>
            <div class='leftDiv labelDiv col-xs-4 col-sm-2 fullRecLabelEnglish'>Keywords : </div><div class='valueDiv leftDirection leftAlign col-xs-8 col-sm-10 fullRecValueEnglish'>MIM devices; X-ray diffraction; laser beam annealing; X-ray diffraction measurement; capacitance density; kigh-κ Ni/ZrO2/TiN MIM capacitors; laser annealing; laser-annealing technique; metal-insulator-metal capacitors; reliability; tetragonal-phase formation; <formula formulatype=$hbox{ZrO}_{2}$; High-$kappa$; laser annealing; metal–insulator–metal (MIM); reliability;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2010.2049636
Filename :
5482029
Link To Document :
بازگشت