Title :
Micromachined WR-3 waveguide filter with embedded bends
Author :
Shang, Xiaobing ; Ke, M.L. ; Wang, Yannan ; Lancaster, Michael J.
Author_Institution :
Sch. of Electron., Electr. & Comput. Eng., Univ. of Birmingham, Birmingham, UK
Abstract :
Presented is a micromachined WR-3 waveguide filter with two embedded H-plane back-to-back bends fabricated using thick SU-8 photoresist micromachining technology. The filter was constructed with four silver-coated SU-8 layers with a thickness of 0.432 mm for each layer. These layers were then bonded on top of each other to form the filter. This layered WR-3 waveguide filter with bends exhibited a minimum insertion loss of 3.3 dB and an 8.8 3 dB fractional bandwidth at a central frequency of 293.2 GHz. The measured return loss is better than 16 dB across the whole passband.
Keywords :
micromachining; millimetre wave filters; photoresists; waveguide filters; embedded H-plane back-to-back bends; fractional bandwidth; frequency 293.2 GHz; loss 3.3 dB; micromachined WR-3 waveguide filter; minimum insertion loss; silver-coated SU-8 layers; size 0.432 mm; thick SU-8 photoresist micromachining technology;
Journal_Title :
Electronics Letters
DOI :
10.1049/el.2011.0525